型号: | 定制型 |
---|---|
品牌: | 拓吉泰 |
原产地: | 中国 |
类别: | 化工 / 无机原料 / 氧化物 |
标签︰ | 纯硅靶材 , 真空镀膜靶材 , 磁控溅射靶材 |
单价: |
¥40000
/ 根
|
最少订量: | 1 根 |
最后上线︰2022/10/11 |
喷涂硅靶材 Spray Si Target
产品说明Product description
以等离子体为热源,在真空环境,或负压氮气或氩气保护环境下将Si粉末加热到熔融或半熔融状态并高速冲击背管表面形成致密涂层,从而制备出高纯度、低氧含量、高致密度Si靶材。
With plasma as the heat source, high purity, low oxygen content, high density Si targets are produced from Si powder. The Si powder is heated to molten or semi-molten state in vacuum or at a negative pressure of nitrogen (N2) or argon (Ar) and deposited on the surface of backing tube at high speed to form dense coatings.
产品特点Products feature
项目 Item |
参数 Specifications |
检测手段 Testing method |
纯度Purity(Si+B) |
≥ 99.99% |
|
密度Density |
≥2.2 g/cm3 |
阿基米德密度仪 Archimedes densimeter |
杂质含量Inclusions |
Fe +Al+Ca: ≤50 ppm B: ≤100 ppm O: ≤2000 ppm N: ≤500 ppm 杂质总和(O、N、B除外): ≤100 ppm Total impurity (excluding O, N, B ): ≤100 ppm |
ICP |
电阻率 Electrical resistivity |
≤10Ω·cm |
四探针电阻率仪 Four probe resistivity meter |
背管材质 Backing tube
-选用304/316L不锈钢(无磁)。
304/316L stainless steel (non-magnetic).
靶材尺寸Dimension
-按照图纸要求加工
According to customized drawings.
应用领域Applications
-用于制作SiO2/Si3N4膜,主要用于光学玻璃,触摸屏之AR膜系,Low-E镀膜玻璃,半导体电子,平面显示,触摸屏。
For deposition of SiO2/Si3N4 films, for optical glasses, AR films of touch panel screens, Low-E glasses, semiconductor devices and flat panel screens.